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基于XRD的薄膜界面结合强度试验研究
发布日期:2008-5-15 9:40:26

Experimental Study on Interfacial Bonding Strength of the Film by XRD

KONG De-jun, ZHANG Yong-kang, LU Jin-zhong, FENG Aixin, Ren Xudong, GE Tao (School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013 China)

Abstract:

The stresses and variational laws of the film interface were measured by X-ray diffraction (XRD), and the principle, method and process of measuring interfacial bonding strength of the film were established by measuring of interfacial bonding state. The method of measuring interfacial bonding strength of the film is a non-contact measurement, which is applied to measure interfacial bonding strength of multi-crystal and crystal film, it is a new kind of experimental method to research and measure bonding strength of the film.[著者文摘]

Key words:

bonding strength; X-ray diffraction (XRD); film; residual stress

利用X射线衍射技术(XRD)分析了薄膜结合界面应力及其变化规律,通过对薄膜界面结合状态的检测,建立了X衍射法测量薄膜界面结合强度的原理、方法与过程。其检测界面结合强度方法可对薄膜试样进行非接触检测,适用于晶体或多晶体薄膜的界面结合强度测量,是一种研究无损检测薄膜结合强度的试验新方法。